Electronics and Photonics |
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| Session 310 - Plasma Processing and Emerging Applications | |||
| Plasma Processing | |||
| Chair: | Sumit Agarwal | ||
| CoChair: | Jane P. Chang | ||
| 310a | Compositional Tuning of Bimetallic Nanoparticles for Low Temperature Carbon Nanotube Growth Wei-Hung Chiang, R. Mohan Sankaran |
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| 310b | Design of a High Throughput Microwave Plasma Reactor for Bulk Production of Metal Oxide Nanowires Jeong H. Kim, Vivekanand Kumar, Mahendra K. Sunkara |
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| 310c | Modeling Plasma-Surface Interactions and Their Role In Inducing Structural Transitions In Materials Dimitrios Maroudas |
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| 310d | 3-Dimensional Monte Carlo Profile Simulation and Experimental Measurements of Surface Roughness Under Plasma Etching Wei Guo, Hiroyo Kawai, Herbert H. Sawin |
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| 310e | Simulation of Profile Evolution In Shallow Trench Formation by Plasma Etching John Hoang, Jane P. Chang |
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| 310f | Molecular Dynamics Simulations of Plasma-Surface Interactions: Nanoscale Feature Etching on a Silicon Substrate Joseph J. Végh, David B. Graves |
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| 310g | Stochastic Differential Charging and Its Effects on Charging Damage and Feature Profile Evolution during Plasma Processing Eunsu Paek, Gyeong S. Hwang |
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| 310h | Coupling Gas Phase and Surface Reaction Kinetics In C4F8 and SF6 Plasmas Used for Si and SiO2 Etching George Kokkoris, Evangelos Gogolides, Andy Goodyear, Mike Cooke |
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