Electronics and Photonics |
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| Session 204 - Atomic Layer Deposition | |||
| Atomic Layer Deposition This oral presenter session welcomes papers from a broad range of topics related to ALD including: equipment design, new precursor chemistries, new materials, new applications, and computational and experimental studies of chemical mechanisms and reaction pathways associated with ALD. | |||
| Chair: | Brian G. Willis | ||
| CoChair: | Charles Musgrave | ||
| 204a | Molecular Layer Deposition of Nanoscale Organic Films Paul W. Loscutoff, Stacey F. Bent |
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| 204b | Ald Copper-Palladium Thin Films for Molecular Electronics Irene Hsu, Brian G. Willis |
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| 204c | Lanthanum Stabilization of Ald-Grown Hafnia John G. Ekerdt, Tuo Wang |
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| 204d | Atomic Layer Deposited Y2O3 Thin Films Using Novel Cyclopentadienyl-Type Yttrium Precursor Christos G. Takoudis |
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| 204e | Surface Reaction Mechanism during the Atomic Layer Deposition of Titanium Dioxide from Titanium Tetraisopropoxide and Ozone Sumit Agarwal, Vikrant R. Rai |
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| 204f | Effect of Yb3+ Co-Doping on the Luminescent Properties of Er3+ :Y2O3 Thin Films John Hoang, Jane P. Chang |
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