Amar B. Pawar, Department of Chemical Engineering, The City College of the City University of New York, Steinmann Hall, 140 ST. and Convent Avenue, New York, NY 10031 and Ilona Kretzschmar, Department of Chemical Engineering, The City College of City University of New York, 140th St. at Convent Ave., New York, NY 10031.
Patchy particles are the next generation building blocks for assembling different colloidal structures. Precise control over the patch size and shape is required to guide the assembly into well-defined target structures. We have employed the glancing angle deposition (GLAD) technique to produce patchy particles and have shown that the angle of deposition and the orientation of the particle monolayer with respect to the source decide the patch size and geometry.
1 We will report results from an extension of the GLAD technique to produce patchy particles with multiple patches. Here, the multiple patches can either be (i) of the same material, which produces patchy particles with complicated patch shapes, such as a cross-shaped patch or (ii) of different materials, which produces multifunctional patchy particles. Further, we will present data on the characterization of the patch geometry by fluorescent labeling of the patches.
This extension of the GLAD technique facilitates the production of patchy particles with a variety of patch geometries, which will be difficult if not impossible to produce by other techniques.
1) Pawar, A. B.; Kretzschmar, I. Langmuir 2008, 24 (2), 355 – 358.